Beilstein Arch. 2024, 202467. https://doi.org/10.3762/bxiv.2024.67.v1
Published 22 Nov 2024
This literature presents a comprehensive optimization of key parameters crucial for generating ion beams in a microwave-coupled plasma-based ultra-low energy Electron Cyclotron Resonance (ECR) ion source, generally used for nano-structuring on solid surfaces. The investigation focuses on developing, accelerating, and extracting Ar+ ions from a magnetron (microwave) coupled plasma cup utilizing three-grid ion extraction composed of molybdenum. The study systematically examines the dependence of ion beam current on critical parameters, such as gas pressure, magnetron power, extraction voltage, and ion energies. Additionally, the influence of extraction voltage on beam current is investigated for different ion energies. The variation of beam current as a function of ion energy is explored under constant magnetron current and extraction voltage at various conditions. The Gaussian nature of the beam profile is scrutinized and elucidated within the context of grid extraction-based ion sources. Plasma physics principles are employed to interpret the observed variations in ion current density (beam current) with various parameters. The corresponding ion-induced nanopatterning on silicon, using the optimized beam current, is explored in detail. Furthermore, the research delves into the temporal evolution of the surface topography of silicon followed by off-normal incidences (60º and 72.5º) is Ar-ion extracted at 450 eV Ar-ions. The changes in the optical property, resulting from nano-patterned surfaces, investigated using UV-VIS spectroscopy, is correlated the with dimension of nano patterning. This manuscript highlights the potential applications arising from these findings, emphasizing the transformative impact of low energy inert ion induced nano-patterning technologies.
Keywords: Ultra-low energy ECR-based ion source, Optimization of ion current, Surface topography, TEM, UV-VIS spectroscopy
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Mukherjee, J.; Mullick, S. A.; Basu, T.; Som, T. Beilstein Arch. 2024, 202467. doi:10.3762/bxiv.2024.67.v1
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